Kilwon Cho and co-workers have introduced a novel heat-assisted photoacidic oxidation method to effectively hydroxylate the polar surface of high-k polymer gate dielectrics without compromising their insulating properties. This method allows for the self-assembly of dense and ordered organic monolayers on the polymer dielectric surface, leading to stable operation of organic transistors.-Scientific Journal cover design by scapiens

https://onlinelibrary.wiley.com/doi/abs/10.1002/adfm.201970071